The Falcon ICS 412 inline flux coating/wafer washing system is capable of dispensing up to 4 process fluids (2 standard – i.e. flux, bowl wash) on wafers ranging in size from 4 inches to 12 inches (300mm). No tool changes are required when changing from 6” through 12” wafer sizes. With an unlimited number of recipe steps, all process parameters are fully programmable including dispense start, end, sweep and height. The servo drive spin chuck is programmable with speeds from 1 to 2000 RPM. The spin chuck vacuum system includes a fluid trap reservoir to prevent vacuum system contamination. The fully servo driven controlled inline belt transport requires no adjustments, no robot teaching, or sensor adjustments. The diagnostics mode of the software allows visual maintenance of all input, outputs, servomotors, and encoders. The engineering mode allows direct and immediate process changes in real time. Password protection allows multiple level operator use.

System facility requirements include electricity, vacuum, N2, and water. High volume vacuum exhaust is required for the washer configuration. Options include wafer wash capabilities and the ability to process up to 4 fluids with 2 being standard.

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